GrabCAD 模型信息
Chemical Vapor Deposition Reaction Chamber ( still in progress) · 模型 144744
Chemical Vapor deposition (CVD) is a process where a thin film of precursor gas gets deposited on a substrate under Vacuum . I am currently designing the reaction chamber for CVD its the main component of it , the last part to add here will be either a setup for solenoidal heating or wafer heating .
- 格式
- PTC Creo Parametric
- 分类
- Electrical、Industrial design、Machine design
- 标签
- 未标注
- 数据更新
- 2026-09-10T12:40:58Z
